HIGH TEMPERATURE CLOSED-LOOP SEMI-AQUEOUS BATCH ELECTRONICS CLEANING SYSTEMS - AquaTherm 9200

The AquaTherm™ 9200, from Austin American Technology, introduces a new era to batch cleaning. Forget the limitations of the past and experience a batch cleaner that offers multiple cleaning technologies for capability previously unachieved in a compact footprint. In addition to aqueous and aqueous chemistry-based cleaning, the innovative AquaTherm™ supports process temperature ranges from ambient to 200°F and adds the power of steam. When selected, the onboard steam generator produces hot water vapor to penetrate and soften tough, baked-on flux and paste residue so the standard wash cycle can effectively complete the cleaning process. An intuitive user interface allows the operator to select the type and duration of wash, number of rinse cycles, and duration of the forced-air dry cycle. Ideal for printed circuit boards, semiconductors, subassemblies and process tooling, the AquaTherm™ brings flexible, unparalleled cleaning performance to the batch process. Additionally the AquaTherm™ 9200 features a heated holding tank, de-foamer metering pump, rinse-aid metering pump, and HEPPA filtration. Providing the highest cleanliness standard, allowing the customer to meet and surpass cleanliness requirements.

Availability: In Stock

Condition: New

Brand: AAT Corporation

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Multiple Chemistry Choices
Cleans in tight spaces
Rinses to Programmable Cleanliness Level
Two Metering Pumps
Process Viewing Window
Heated Holding Tank
HEPPA Dry Air Filtration
High Temperature (199F) Operation
Multiple Steam Cycle Capability
User-Friendly Operator Interface
Cleans with Water or Semi-Aqueous Chemistry
HIGH TEMPERATURE WASH & RINSE CYCLE.
As theAquaTherm™’snomenclature suggests, the system is designed from the ground up for high temperature operation, with a wash and rinse operating temperature of 199F (93C). This allows for cleaning under lower stand-off components. As well as allows the system to fully utilize semi-aqueous based chemistires allowing the system to operate at lower chemical concentrations (on average between 2 – 4%).
 
OPEN LOOP WASH OPERATION.
The wash fluid is sent to facility drain after the wash cycle is completed. Paired with high temperature wash operation the system is capable of running a lean chemical concentration in order to reduce operating costs. A concentration of 2 – 4% is possible, while maintaining complete assembly de-fluxing.Closed Loop Wash Operation. The wash fluid is sent to an internal wash reservoir after the wash cycle is complete. Allowing the system to reuse the aqueous/semi-aqueous solvent.
 
HEPA DRY AIR FILTRATION
In order to reduce dust contamination and to maintain clean-room compliance, the system is fitted with HEPA dry air filtration. Preventing air-borne particulates from contaminating cleaned components. This is especially applicable with optics and wide range of particulate sensitive components. IAC (IONIC ABSORPTION COLUMN) READY. TheAquaTherm™ 9600is designed for closed loop water-only operation. In order to accomplish this, it is fitted with IAC plumbing, which allow the facility to fit an IAC tank directly into the machine. This will recycle the wash water by removing flux from the medium.
 
CHEMICAL DISPENSING SYSTEM.
This features a chemical dispansing pump, allowing for recipe independent chemical concentrations (0 – 30%). This means that the engineer can maintain process recipes with varying chemistry concentrations, allowing for a high degree of process configurability and flexibility.Chemical Dispensing system is also optionally available onAquaTherm™ 9200systems.Allowing the system to fill the integrated wash holding tank with the required chemical concentration.
 
DE-FOAMER DISPENSING SYSTEM.
In water-only based cleaning applications foaming can be an issue. In order to address this without added cost nor operation reliance, the system can dispense de-foamer package during the rinse cycle to reduce foaming. As is the case with the Chemical Dispensing System, this is programmed on a per recipe basis.
 
RINSE-AID DISPENSING SYSTEM.
In order to address glass chips (i.e. CCD, CMOS, etc.) as well as various optics cleaning applications, this system provides for Rinse-Aid metering. This allows theAquaTherm™to de-flux a circuit board during the primary wash cycle and clean the optics with a separate cycle. All of this is recipe dependent allowing for inclusion/exclusion on a per-recipe basis.
 
HEATED HOLDING TANK.
This feature goes hand-in-hand with closed loop wash operation. This feature includes an insulated stainless-steel holding tank with an immersion heater for temperature control. The system is additionally fitted with a recirculation pump, allowing the holding tank to continously mix the cleaning solvent.
 
 
 
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